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weiter5494
Silent Member
 

¥[¤J¤é´Á: Nov 2013
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2013¦~ªì»PIntelñ­q14nm FinFET¥N¤u­q³æªºTSMC¦Ñ«È¤áAltera¡A¥Ñ©óIntel¤è­±¶i®i¤£¦p¹w´Á¡Aªñ´Á¦^ÀY¦V¥x¿n¹q°l¥[20nm²£¯à¡C¤§«eXilinx¤w«Å§G·s¤@¥N¬[ºcUltrascaleªºFPGA²£«~¥HTSMCªº20nm¾É¤J¶q²£¡C
- udn@2013/12/02

2014¦~4¤ë¤¤¡AAltera»PTSMC¦@¦P«Å¥¬¡A«eªÌªºArria 10²£«~½u¦P®É±Ä¥Î¤FTSMCªº20SoC»sµ{»P²Ó¶¡¶Z»É¥Y¶ô«Ê¸Ë§Þ³N¡A¸û«e¥N28nm²£«~¸`¯à40%¡CTSMC«ÅºÙ¨ä»É¥Y¶ô«Ê¸Ë¨}²v¥i¹F99.8%¡C

2014¦~4¤ë24¤é¡AAltera¦A«Å¥¬±Ä¥ÎIntelªº14nm»sµ{ªº´ú¸Õ´¹¤ù¤w²£¥X¡A¥¼¨ÓStratix 10²£«~±N·f°t©Ò´ú¸Õªº¥\¯àIP¡CStratix 10¥u­nStratix Vªº30%¥\¯Ó§Y¥i¹F¬Û¦P®Ä¯à¡C¬Û¸û¤§¤U¡AStratix 10®Ä¯à§ïµ½¦Ü1.4~1.6­¿¡A¬Æ¦Ü¦b1.3­¿¥\¯Ó¤U¥i¹F2­¿®Ä¯à¡A¥u­n¦b·s¬[ºc¤W¶i¦æ³¡¤À­×§ï¡C­Y¥u»Ý¨D¤µ¤éªº®Ä¯à¤ô¥­¡A¤¤¶¥©w¦ìªºArria 10¡]TSMC 20SoC-based¡^§Y¥iº¡¨¬¡C

Testing vital elements of our FPGAs in 14nm Tri-Gate silicon allows us to validate device performance early in the design process and significantly accelerate the availability of our 14nm-based products.
- Brad Howe, senior vice president of research and development at Altera


1Q14 Xilinx°]³øÅã¥Ü¡A$6.178»õÀ禬Àu©ó¹w´Á¡A0.53ÁâEPSÅý¥«³õ¥¢±æ¡F®i±æ¥»©uÀ禬«ù¥­¨ì·L¼W4%¡C¨ä¤C¦¨À禬¨Ó¦Û©u¼W40%ªº28nm²£«~¡A20nm²£«~¶}©lµ²ªG¡C

¡§Already bearing fruit¡¨ with chips at 20-nanometer measurements.

·ç«H´£°ª¹ïXilinxÀ禬¦ô­È¡A¤Ï¦Ó­°µû¡CTSMC¥N¤u20nm´¹¤ùªº¥X³f³t«×»P¤¤°ê4G°ò¦a¥xªº³¡¸p¶i®i·|¬O¨â¤jÃöÁä¦]¯À¡C

The company is up against some structural issues with its markets, including the pace at which manufacturing partners can actually manufacture the 20-nano parts, and also just how quickly the market for LTE wireless broadband will get built this year in China. Xilinx chips go into communications equipment sold to China Mobile and other carriers in the country, so any delay hits Xilinx as well.

1Q14 Altera°]³øÅã¥Ü¡A¨ü´f©ó¤¤°ê¿n·¥ªº4G«Ø³]¡A$4.61»õÀ禬»P0.37ÁâEPS¡A¬ÒÀu©ó¹w´Á¡F®i±æ¥»©uÀ禬©u¼W2%~6%¡C¥Ø«eTSMC»PIntel¥¿¤À§O»P¨ä¦X§@20nm¡B14nm¥ý¶i»sµ{²£«~¡C

The quarter benefitted from ¡§stronger than anticipated Chinese LTE deployments.¡¨ We are now shipping Arria 10 FPGAs that offer more logic capacity than any other 20 nm FPGA and speeds that exceed the prior generation high end. Simultaneously, we are making solid progress in the development of our Stratix 10 devices, which use Intel¡¦s 14 nm Tri-gate process plus a new FPGA logic architecture to deliver performance twice that of our current high-end FPGA, with vastly more logic resources, lower power and cost.


°£¤F¤w¶i¤J¶q²£ªº20nm¡ATSMC¥¿¸Õ²£16FinFET¡A¹w­p2015¦~ªì¶q²£¡F¦Ó¸û20SoC´£³t40%¡B¸û16FinFET´£³t15%¡]©Î¦P³t¤U¸`¯à30%¡^ªº¶i¶¥ª©ªº16FinFET+»sµ{¡A¹w­p¤T©u¥½§¹¦¨«È¤á»{ÃÒ¡A¦~©³¥i¶i¤J¶q²£¡C¦Ü©ó²Ä¤T¥N3D¹q´¹Åé»sµ{10FinFET«h³W¹º¦b4Q15¸Õ²£¡A2016¦~¥½¦Ü2017¦~ªì¤§¶¡¶i¤J¶q²£¡C


¥b¾ÉÅé³]³Æ°Ó¬ì½U¤W©u$8.32»õÀ禬»P$1.23ÁâEPS¬ÒÀu©ó¥«³õ¹w´Á¡A¦ý»F¦]´¹¶ê¼t¦b3D¹q´¹Åé»sµ{¨}²v°ÝÃDªº¥»©u®i±æ«o¥O¥«³õ¤Q¤À¥¢±æ¡C

Now in logic and foundry, with the introduction of the new 3-D gate architectures, the yield issues our customers are grappling with today are proving to be the most challenging that the industry have ever faced, and even the smallest variation and process margin can cause significant yield losses for these devices. Some of the issues of these processes people are dealing with are unique defect issues ¡K new etch steps that are all part of the FinFET process. That¡¦s just a small part of the complex technical challenge associated with bringing new 3-D device architectures to market Now, in memory the market leaders continue to demonstrate a commitment to pushing capex investment in both DRAM and NAND. However, they¡¦re also facing similar challenges to logic when they deal with their leading edge complexity ¡K There¡¦s uncertainty over the timing of follow-on production for 3-D NAND ¡K It¡¦s clear from our discussions with customers that despite near-term slowdown in demand their intentions are continue to execute strategy for growth at the leading edge and invest at high level to achieve and advance their competitive roadmap. But it is also clear that issues related to leading edge device yield and high concentration of demand across a consolidated customer base and uncertainty over the timing of follow-on capacity have introduced a degree of variability into our quarterly demand forecast and have made visibility into our customer production plans extremely challenging today.


¦Ó¾Ú·ç«H¤ÀªR¡A¹ï10nm»sµ{§ñÃö¦Ü­nªºEUV¥ú·½¡A­ì­q°Ó¥Î®Éµ{¥Ø¼Ð¡]2017¦~¡^·|¦A«×¸õ²¼¡C»s³y°ÓASML¤W©uÀ禬£á14»õ¡AEPS¹F£á0.57¡F®i±æ¥»©u£á16»õ¡A§C©ó¥«³õ¹w´Áªº£á16.9»õ¡A¦P®É¥¼¥X­q³æ¶È£á10.7»õ¡A¤]¤j´T§C©ó¥«³õ¹w´Áªº£á16.4»õ¡C

The company is ¡§pushing out longer term targets¡¨ for its ¡§extreme ultra violet¡¨ lithography systems, and ¡§without the success of EUV, ASML has limited earnings growth potential.¡¨
ÂÂ 2014-04-28, 10:29 PM #256
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